Extreme Ultraviolet (EUV) Lithography is an optical lithography process that employs a variety of extreme ultraviolet (EUV) wavelengths.

 

Extreme Ultraviolet (EUV) Lithography

Extreme Ultraviolet (EUV) Lithography is a more sophisticated form of lithography that use ultra violet light with the shortest wavelength of 13.5 nm. Lithography is primarily used to print complex designs, most of which are highlight integrated circuits, onto semiconductor wafers.

One of the factors driving the growth of the Extreme Ultraviolet (EUV) Lithography is the increasing usage of smartphones throughout the world. Compact electronics chips are manufactured using extreme ultraviolet lithography technique. These little chips are used to store memory in cellphones and other items. As a result, the growing number of smartphone users throughout the world is likely to drive market expansion over the forecast period. According to the Australian Communications and Media Authority's Communications Report (2018-19), in June 2019, 83 percent (roughly 16.4 million) of Australian adults had a smartphone.

On the supply chain side, the lack of raw materials for component manufacture owing to the total lockdown is a big impediment to industry expansion. Manufacturing enterprises were unable to deliver items to the market due to delays in the delivery of raw materials and components. As a result, the pandemic has an impact on the extreme ultraviolet (EUV) lithography business.

As governments in several nations ease lockdown restrictions, manufacturing is restarting; nevertheless, enterprises are still functioning with partial personnel on the shop floor and working from home. As a result, producers of different electrical and semiconductor components are suffering manufacturing delays. However, high pricing of extreme ultraviolet (EUV) lithography systems and low technological acceptance are obstacles that may stymie extreme ultraviolet (EUV) lithography growth.

Extreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography process that uses a variety of extreme ultraviolet (EUV) wavelengths to build a pattern by exposing a reflective photomask to UV light, which is reflected onto a photoresist-covered substrate. It is commonly used in the production of semiconductor devices. ASML Holding is the sole business that manufactures and distributes EUV equipment for chip fabrication, mostly at 5 nm, as of 2022. TSMC disclosed usage of EUV for 5 nm in contact, via, metal line, and cut layers at the 2019 International Electron Devices Meeting (IEDM), where the cuts may be applied to fins, gates, or metal lines.  At IEDM 2020, TSMC reported their 5 nm minimum metal pitch to be reduced 30% from that of 7 nm, which was 40 nm. Samsung's 5 nm is lithographically the same design rule as 7 nm, with a minimum metal pitch of 36 nm.